Moisture Mask
$90.00

Moisture Mask

SKU: 23356

Reveal brighter, hydrated, younger-looking skin with the deeply hydrating Moisture Mask.

This intense skin boost is designed to be used twice a week or whenever skin feels thirsty and dehydrated.

With an advanced complex of skin quenchers to swiftly restore the skin’s moisture balance and defend against future dryness, dull dehydrated skin is actively replenished and enriched for a more radiant complexion.

How to Apply:
For best results use twice a week in the evening after cleansing.
Apply a generous layer to the face and neck.
Leave for a minimum of 15 minutes and then tissue off any excess product.
This is a leave-on mask so there is no need to rinse off.

Benefits:
-Restores moisture levels in the skin.
-Actively replenishes and rehydrates dull skin.
-Leaves skin feeling more supple and soft.
-Prevents future dehydration and protects from environmental damage.
-Increases cellular renewal for a more radiant complexion.
-Convenient leave-on format.

Actives:
Advanced moisture complex (helps restore moisture levels in the skin by improving the skin’s barrier integrity and helps to prevent future skin dehydration). Aqua complex (helps increase moisture content in all layers of the epidermis and promotes long-lasting hydration). Sodium Hyaluronate (promotes long-lasting hydration). Vitamin E (helps protect the skin from environmental damage).
For best results use twice a week in the evening after cleansing.
Apply a generous layer to the face and neck.
Leave for a minimum of 15 minutes and then tissue off any excess product.
This is a leave-on mask so there is no need to rinse off.
Aqua (Water), Glycerin, Cyclopentasiloxane, Dimethicone, Dimethicone/Vinyl Dimethicone Crosspolymer, Coconut Alkanes, Glyceryl Polyacrylate, Acrylates Copolymer, Phenoxyethanol, Polyglyceryl-3 Oleate, Propanediol, Coco-Caprylate/Caprate, Tocopherol, Sodium Pca, Urea, Sodium Hydroxide, Ethylhexylglycerin, Polymethylsilsesquioxane, Sodium Hyaluronate, Trehalose, Lecithin, Avena Strigosa Seed Extract, Leuconostoc/Radish Root Ferment Filtrate, Lonicera Caprifolium (Honeysuckle) Flower Extract, Polyquaternium-51, 1,2-Hexanediol, Phytic Acid, Hydroxypropyl Bispalmitamide Mea, Lonicera Japonica (Honeysuckle) Flower Extract, Potassium Sorbate.

*Ingredients may be subject to change. The most accurate and up to date product ingredient list can also found on the product packaging.
The core philosophy: perfectly cleansed, exfoliated skin is the key to a glowing complexion. --OR-- Acknowledged as an authority in advanced skincare and highly sought after throughout the world by those seeking luminous, youthful, healthy radiance.

EVE LOM believes anyone can achieve a beautiful radiant complexion through straightforward and effective skincare. Whatever your age, skin type or skin concern, proper cleansing and gentle exfoliation enables your skin cells to regenerate quickly, and creates a vital receptive base for beauty products to work at their best. So that’s the EVE LOM core philosophy: perfectly cleansed, exfoliated skin is the key to a glowing complexion.

A testimony to Eve Lom's success is that this philosophy is now the cornerstone of top skincare routines around the globe. Their multi-award-winning cult products have become beauty insiders' secret weapon – and are still unrivalled in a highly competitive market. Today, with over 25 years’ expertise, EVE LOM is acknowledged as an authority in advanced skincare – and is highly sought after throughout the world, by those seeking luminous, youthful, healthy radiance.